发明名称 UNIFORM ENERGY IRRADIATION DEVICE AND CRYSTALLIZATION DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To suppress variance in beam light condensation density including variation in height of a condensed beam position and variation in laser oscillation energy during crystallization using continuous oscillation laser light. Ž<P>SOLUTION: A uniform energy irradiation device includes a continuous oscillation laser light oscillation source which outputs the continuous oscillation laser light, a laser irradiation optical system which irradiates a substrate surface of a substrate to be processed placed on a substrate stage with the continuous oscillation laser light output by the continuous oscillation laser light oscillation source, a reflected light intensity measuring unit which irradiates a portion of an area, crystallized on the substrate surface by the irradiation with the continuous oscillation laser light, as a measurement area with illumination light in the visible light range and measures the reflected light intensity of reflected light reflected in the measurement area, a beam condensing position adjusting unit which adjusts the beam condensing position of the continuous oscillation laser light on an optical path between the continuous oscillation laser light oscillation source and laser irradiation optical system, and a control unit which inputs the reflected light intensity measured by the reflected light intensity measuring unit, and drives and controls the beam condensing position adjusting unit. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010027932(A) 申请公布日期 2010.02.04
申请号 JP20080189119 申请日期 2008.07.22
申请人 SHIMADZU CORP 发明人 AKITA NORITAKA;TAKAMI YOSHIO
分类号 H01L21/268;H01L21/20 主分类号 H01L21/268
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