CHEMICAL VAPOR DEPOSITION APPARATUS

摘要

PURPOSE: A chemical vapor deposition apparatus is provided to easily perform an installation of a substrate damage sensing unit and a direction control task. CONSTITUTION: Before a substrate is inserted into a process module chamber(200), a load lock chamber(100) creates an environment inserting the substrate into the process module chamber. A transfer module chamber(300) includes a substrate handling robot(400). The substrate handling robot transfers the substrate to the load lock chamber and the process module chamber. At least one substrate damage sensing unit is combined to the sidewall of the transfer module chamber to be attached and detached. The substrate damage sensing unit senses a damage of the substrate inserted to the inside of the transfer module chamber.