| 摘要 |
Certain example embodiments relate to techniques for reducing the amount of debris being formed on the surface of planar sputtering targets. More particularly, a coating may be applied to the sputtering material in areas where sputtering substantially does not occur (typically inside and outside of a racetrack) in certain example embodiments. The coating optionally may be cured. In certain example embodiments, the coating may be include inorganic materials or materials that resist decomposition in a severely oxidizing environment, and/or are electrically non-conductive materials. For example, the coating may be a cured-form sol-gel comprising, for example, silicon oxide, titanium oxide, and/or the like. The coating substantially encapsulates the target material where sputtering substantially does not occur, thus reducing the amount of debris that is created during sputter coating.
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