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发明名称
A projection exposure tool for microlithography
摘要
申请公布号
GB2462151(A)
申请公布日期
2010.02.03
申请号
GB20090002104
申请日期
2009.02.09
申请人
CARL ZEISS SMT AG
发明人
EMIL PETER SCHMITT-WEAVER;MICHAEL CROUSE;ROBERT ROUTH;BERND GEH;WOLFGANG SINGER DR
分类号
G03F7/20
主分类号
G03F7/20
代理机构
代理人
主权项
地址
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