SUBSTRATE ETCHING APPARATUS

摘要

PURPOSE: A substrate etching apparatus is provided to etch both sides by running down etchant in the upper end of a flat display panel at a vertical state, thereby preventing the damage of the surface of the flat display panel. CONSTITUTION: A supporting unit(2) supports a flat display panel(5) in a vertical state. In correspondence with the flat display panel, an etchant supply unit(3) is arranged in the upper part of the supporting unit. The etchant supply unit runs down etchant to both sides of the flat display panel in the upper end of the flat display panel. The etchant supply unit is formed along the longitudinal direction of the flat display panel. The etchant supply unit supplies etchant with the gravity along the upper end line(53) of the flat display panel.