发明名称 |
METAL CATALYST DOPING APPARATUS AND METHOD AND METHOD OF MANUFACTURING FLAT DISPLAY DEVICE USING THE SAME |
摘要 |
PURPOSE: A metal catalyst doping apparatus and method and method of manufacturing flat display device using the same are provided to perform steadily doping process. CONSTITUTION: The cathode part is fixed according to the height direction of the processing chamber. The amorphous Si is formed on the substare(G). Cathode comprises a plurality of sub cathode parts. The plasma is formed in the front side. The blocking plate is located among a plurality of swelling pole portions between neighboring two swelling pole portions. The blocking plate crosses the moving boundary of the metal catalyst. The metallic catalyst is emitted from two swelling pole portions.
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申请公布号 |
KR20100008105(A) |
申请公布日期 |
2010.01.25 |
申请号 |
KR20080068512 |
申请日期 |
2008.07.15 |
申请人 |
IRUJA CO., LTD. |
发明人 |
HAN, GI YOUL;KO, KWANG SOO;KIM, MUN SIK;LEE, WON YONG;CHOI, JUENG HWAN |
分类号 |
H01L21/203;H01L21/18 |
主分类号 |
H01L21/203 |
代理机构 |
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代理人 |
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地址 |
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