发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE: A photosensitive resin composition is provided to form pattern and coating film suitable for a display device such as a liquid crystal display, and to ensure excellent heat resistance. CONSTITUTION: A photosensitive resin composition comprises (A) a compound having at least one group selected from allyl group and meta allyl group; (B) a compound having at least two mercapto groups; (C) a photopolymerization initiator; and (E) alkali soluble resin. The content of alkali soluble resin(E) is 30 mass % or more and 90 mass % or less based on the total content of the (A) compound, (B) compound, and (E) alkali soluble resin.
申请公布号 KR20100007744(A) 申请公布日期 2010.01.22
申请号 KR20090061989 申请日期 2009.07.08
申请人 SUMITOMO CHEMICAL CO., LTD. 发明人 SHIROUCHI YUKO
分类号 G03F7/027;G03F7/028 主分类号 G03F7/027
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