APPARATUS FOR GENERATING HOLLOW CATHODE PLASMA AND APPARATUS FOR TREATING A LARGE AREA SUBSTRATE BY HOLLOW CATHODE PLASMA

摘要

PURPOSE: An apparatus for generating hollow cathode plasma and a large area substrate processing device using the hollow cathode plasma are provided to supply high density plasma through the hollow cathode effect by a hollow cathode. CONSTITUTION: A plurality of lower grooves(41) are formed on a hollow cathode(40). The plasma is generated on a lower side of the hollow cathode. An electrode is separated from the hollow cathode. A power supply unit(61,62) is connected to one of the hollow cathode and the electrode. An inflow hole(42) is provided on a part of the lower groove. The inflow hole is extended to pass from the upper end of the inflow hole to the upper side of the hollow cathode.