SPACER FILL STRUCTURE, METHOD AND DESIGN STRUCTURE FOR REDUCING DEVICE VARIATION
摘要
A design structure (100, FIG. 1a) is provided for spacer fill structures (100 and 300) and, more particularly, spacer fill structures (100 and 300), a method of manufacturing and a design structure for reducing device variation is provided. The structure includes a plurality of dummy fill shapes (100) in different areas of a device which are configured such that gate perimeter to gate area ratio will result in a total perimeter density being uniform across a chip.
申请公布号
WO2010008748(A1)
申请公布日期
2010.01.21
申请号
WO2009US47719
申请日期
2009.06.18
申请人
INTERNATIONAL BUSINESS MACHINES CORPORATION;ANDERSON, BRENT, A.;BRYANT, ANDRES;RANKIN, JED, H.;NOWAK, EDWARD, J.
发明人
ANDERSON, BRENT, A.;BRYANT, ANDRES;RANKIN, JED, H.;NOWAK, EDWARD, J.