The present invention relates to a processing device and to a control method therefor. In the present invention, a level operated by a plurality of heating sources is adjusted in accordance with factors such as the input operating level of the whole of the heating sources where an input unit receives input. Consequently, when the present invention is employed, there is the advantage that a substance to be processed is processed relatively rapidly through the use of a plurality of heating sources.
申请公布号
WO2009145497(A3)
申请公布日期
2010.01.21
申请号
WO2009KR01745
申请日期
2009.04.03
申请人
LG ELECTRONICS INC.;LEE, SANG-RYUL;CHIN, JAE-MYUNG;CHOI, SI-YOUNG;CHOI, SUNG-HO;KIM, KYU-YOUNG;KIM, DONG-HAN