EXPOSURE APPARATUS, COATINGS FOR EXPOSURE APPARATUS, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED THEREBY

摘要

PROBLEM TO BE SOLVED: To provide a lithographic apparatus for reducing or eliminating adhesion of contaminant for various components of the exposure apparatus.

SOLUTION: The exposure apparatus includes a radiation system configured for supplying radiation beam, a patterning apparatus for patterning the radiation beam according to a required pattern, a substrate table for supporting a substrate, and a projection system for projecting a patterned radiation beam to the target on the substrate. At least a portion of the substrate table is covered with a coating. The coating includes a metal oxide, a photocatalyst, or a semiconductor material, or the combination thereof.

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