发明名称 CHARGED PARTICLE BEAM IRRADIATION SYSTEM AND CHARGED PARTICLE BEAM EMISSION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a charged particle beam irradiation system and a charged particle beam emission method for efficiently emitting and using accumulated beam in a synchrotron and supporting the flatness of an amount of irradiated beam. Ž<P>SOLUTION: The charged particle beam irradiation system includes: a measurement means 15 for measuring an accumulated beam charge amount Qm0 of the ion beams orbiting in the synchrotron 13 for thirteen times immediately before an emission control period in an operating cycle of the synchrotron 13; and beam emission control means 20, 24, 28, and 29 for controlling emission of the ion beams so that emission of a total amount of the ion beams is to be completed in time with expiration of an emission control time Tex which is pre-set based on the measurement Qm0 of the accumulated beam charge amount. When an irradiation apparatus includes an RMW (Range Modulation Wheel) 32, an amplitude of an emission high frequency voltage is controlled according to a ratio Qm0/Qs0 of the measurement to a reference value of the accumulated beam charge amount and a ratio Tb/Ta of an actual beam emission time to the emission control time Tex. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010011962(A) 申请公布日期 2010.01.21
申请号 JP20080173451 申请日期 2008.07.02
申请人 HITACHI LTD 发明人 NISHIUCHI HIDEAKI;SAITO KAZUYOSHI;TADOKORO MASAHIRO;AKIYAMA HIROSHI;HIRAMOTO KAZUO
分类号 A61N5/10;G21K1/093;G21K3/00;G21K5/00;G21K5/04;H05H13/04 主分类号 A61N5/10
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