发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To solve the following problems: the conventional dicing device which divides semiconductor chips at an element formation portion cannot be used since a thick peripheral portion is left in a final process in a process of manufacturing a semiconductor wafer in which only the element formation portion is made thin and the peripheral portion still has the initial thickness of a semiconductor substrate, and a new facility investment is necessary. SOLUTION: The semiconductor substrate which has the initial thickness (first thickness) has only the element formation portion made thin to a second thickness and after a metal layer is formed on its backside, the initial peripheral part which still has the initial thickness (first thickness) of the semiconductor device is ground from the backside to a third thickness to form a peripheral portion which has a small step with the element formation portion. Consequently, the element formation portion and peripheral part are cut apart from each other by the conventional dicing device without introducing a new dicing device for cutting off the thick peripheral portion. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010016188(A) 申请公布日期 2010.01.21
申请号 JP20080174861 申请日期 2008.07.03
申请人 SANYO ELECTRIC CO LTD;SANYO SEMICONDUCTOR CO LTD 发明人 OKADA KIKUO
分类号 H01L21/304;B24B1/00;H01L21/301 主分类号 H01L21/304
代理机构 代理人
主权项
地址