| 摘要 |
Process of depositing nanoparticles of a metal or of an alloy of said metal, said metal being chosen from the metals from columns VIIIB and IB of the Periodic Table, dispersed on a substrate by chemical vapour deposition (CVD), from one or more precursors, in which the deposition is carried out in the presence of a gas comprising more than 50 vol % of a reactive oxidizing gas. Substrate comprising at least one surface, dispersed on which are nanoparticles made of a metal or of an alloy of metals, for example made of silver or a silver alloy. Use of the substrate to catalyse a chemical reaction, for example an NOx elimination reaction.
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