发明名称 |
Baffle plate, apparatus for producing the same, method of producing the same, and gas processing apparatus containing baffle plate |
摘要 |
The present invention provides a gas process apparatus that realizes uniform exhaust without depending on process conditions, a gas process chamber that constitutes the gas process apparatus, a baffle plate mounted on the gas process chamber, a method of producing the baffle plate, and an apparatus for producing the baffle plate. The baffle plate of the present invention serves as a partition between a process space in which a chemical process is carried out with a supplied gas, and a duct that is adjacent to the process space and functions to discharge exhaust gas generated as a result of the chemical process. In accordance with the difference between the pressures on both sides of the baffle plate, which difference varies depending on the location on the baffle plate, the baffle holes are disposed on a plurality of locations on the baffle plate.
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申请公布号 |
US7648610(B2) |
申请公布日期 |
2010.01.19 |
申请号 |
US20020168451 |
申请日期 |
2002.10.11 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
KOMIYA TARO;OSADA HATSUO;HOSAKA SHIGETOSHI;YONENAGA TOMIHIRO;TOMOYASU MASAYUKI |
分类号 |
H01L21/302;H01L21/3065;B01J19/00;C23C16/00;C23C16/44;C23C16/455;H01J37/32;H01L21/205;H01L21/306 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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