发明名称 VERFAHREN ZUR HERSTELLUNG VON NANOSTRUKTUREN AUF EINEM SUBSTRAT
摘要 #CMT# #/CMT# The method involves adding drops of solution for nanostructure formation in water at a temperature above a predetermined temperature, in which the drops of solution floats to a substrate on a steam pad. The steam pad heats the substrate to evaporate the added drops, leaving and forming nanostructures on the substrate. The temperature of the substrate is set above 200 degrees Celsius, and is tilted before or immediately after dropping the solution. The substrate is heated in several minutes or few hours for continuous growth of nanostructures. #CMT#USE : #/CMT# For producing nanostructures, e.g. nanodots, nanowires, nanotubes, on a substrate or silicon wafer used in MEMS or microchips. #CMT#ADVANTAGE : #/CMT# Ensures simple mass production of nanostructures on a substrate using materials exhibiting electrical, optical, magnetic and thermodynamic characteristics due to quantum effects. Ensures very short production process time, improved production yield and wide coverage in producing nanostructures on a substrate without using expensive equipment. #CMT#DESCRIPTION OF DRAWINGS : #/CMT# The figure is a picture showing the parallel running nanowires and nanodots formed on a substrate.
申请公布号 AT454353(T) 申请公布日期 2010.01.15
申请号 AT20060818093T 申请日期 2006.11.24
申请人 CHRISTIAN-ALBRECHTS-UNIVERSITAET ZU KIEL 发明人 ELBAHRI, MADY;ADELUNG, RAINER;PARETKAR, DADICHI
分类号 B82B3/00;C30B7/00;C30B29/60 主分类号 B82B3/00
代理机构 代理人
主权项
地址