| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique which correctly and stably perform matching (discriminating from a false report) even if a minute pattern disappears, and also to provide an inspection device which implements the technique. Ž<P>SOLUTION: The inspection device has in addition to a normal template, a degeneration template which simulates a status in which minute pattern has disappeared, and correctly and stably acquires a matching position even if a minute pattern has disappeared on a real wafer by performing matching with a plurality of templates and merging candidates acquired by each matching. Even when the pattern which exists in CAD data has disappeared on the real wafer, matching is stably performed without failure. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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