发明名称 |
Restricted radiated heating assembly for high temperature processing |
摘要 |
A vapor deposition reactor and associated method are disclosed that increase the lifetime and productivity of a filament-based resistive-heated vapor deposition system. The reactor and method provide for heating the filament while permitting the filament to move as it expands under the effect of increasing temperature while limiting the expanding movement of the filament to an amount that prevents the expanding movement of the filament from creating undesired contact with any portions of the reactor.
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申请公布号 |
US7645342(B2) |
申请公布日期 |
2010.01.12 |
申请号 |
US20050272909 |
申请日期 |
2005.11.14 |
申请人 |
CREE, INC. |
发明人 |
EMERSON DAVID TODD;GARNER ROBERT ALLEN;BERGMANN MICHAEL JOHN;BROWN KEENAN CARLYLE;PENNINGTON MICHAEL ALLEN;COLEMAN THOMAS GOLDTHWAITE |
分类号 |
C23C16/00;C23F1/00;H01L21/306 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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