发明名称 Spectral purity filters for use in a lithographic apparatus.
摘要 According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 μm.
申请公布号 NL2003158(A1) 申请公布日期 2010.01.12
申请号 NL20092003158 申请日期 2009.07.09
申请人 ASML NETHERLANDS B.V. 发明人 WOUTER SOER;MAARTEN VAN HERPEN;VADIM BANINE;ANDREY YAKUNIN;MARTIN JAK
分类号 G03F7/20;G02B5/20 主分类号 G03F7/20
代理机构 代理人
主权项
地址