| 摘要 |
PURPOSE: A substrate cleaning apparatus is provided to prevent mist of a cleaning solution using an upper cup and a cleaning unit. CONSTITUTION: A substrate cleaning apparatus(1) includes a cleaning unit(30). The cleaning unit includes a cleaning base(31) and a base unit(32). The cleaning base with a sponge shape is positioned on the base unit and is contacted with the base unit. A cleaning solution discharge hole(33) is positioned on the center of the base unit and the cleaning base. The cleaning solution discharge hole is connected to a plurality of connection grooves(35). An exhaust hole(36) connected to the connection holes is formed on the position where the connection groove is positioned on the base unit.
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