发明名称 |
EXPOSURE EQUIPMENT AND DEVICE MANUFACTURING METHOD |
摘要 |
<p>Exposure apparatus (EX) exposes a substrate (P) by irradiating the substrate (P) with exposure light (EL) via a projection optical system (PL) and a liquid (LQ). The exposure apparatus (EX) is provided with a liquid immersion mechanism (1) for supplying the liquid (LQ) and recovering the liquid (LQ). The liquid immersion mechanism (1) has an inclined surface (2), which is opposite to a surface of the substrate (P) and is inclined with respect to the surface of the substrate (P), and a liquid recovering port (22) of the liquid immersion mechanism (1) is formed in the inclined surface (2). A flat portion (75) is provided between the substrate (P) and the projection optical system (PL). A liquid immersion area can be maintained to be small.</p> |
申请公布号 |
HK1105243(A1) |
申请公布日期 |
2010.01.08 |
申请号 |
HK20070113529 |
申请日期 |
2007.12.12 |
申请人 |
NIKON CORPORATION;NIKON ENGINEERING CO., LTD. |
发明人 |
NAGASAKA, HIROYUKI;OKUYAMA, TAKESHI |
分类号 |
G03F;G03F7/20;H01L;H01L21/027 |
主分类号 |
G03F |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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