APPARATUS FOR SUPPLYING GAS AND APPARATUS FOR PROCESSING SUBSTRATE USING THE SMAE

摘要

PURPOSE: A gas supply device and a substrate process device using the same are provided to secure uniformity of a process by differentially supplying the first gas and the second gas to a first area and a second area. CONSTITUTION: A first gas source(310) supplies the first gas. A first supply line provides the supply path of the first gas. A plurality of first branch lines are connected to the first supply line and supply the first gas to the plural parts of the supply place. A second gas source(330) supplies the second gas. The second supply line supplies the supply path of the second gas. A plurality of second branch lines(333) are connected to the second supply line and separate the gas. The plurality of second branch lines are connected to the plurality of first branch lines respectively.