发明名称 FILM THICKNESS MEASURING INSTRUMENT AND FILM THICKNESS MEASURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a film thickness measuring instrument measuring a film thickness with higher accuracy. SOLUTION: A modeling part 721A renews film thicknesses d<SB>1</SB>of a first layer in order according to a parameter renewing order from a fitting part 722A to renew a function representing theoretical reflectivity according to film thicknesses d<SB>1</SB>after the renewal. Further, the modeling part 721A repeatedly calculates theoretical reflectivity (spectrum) at respective wavelengths according to the renewed function. Under such a procedure, the film thicknesses d<SB>1</SB>of the first layer are determined by fitting. If the fitting does not converge within a stipulated number of times, the film thicknesses d<SB>1</SB>of the first layer are determined by using Fourier transformation. COPYRIGHT: (C)2010,JPO&amp;INPIT
申请公布号 JP2010002327(A) 申请公布日期 2010.01.07
申请号 JP20080162046 申请日期 2008.06.20
申请人 OTSUKA DENSHI CO LTD 发明人 FUJIMORI MASAYOSHI;SAWAMURA YOSHIMI
分类号 G01B11/06;H01L21/66 主分类号 G01B11/06
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