| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate cleaning apparatus capable of effectively removing deposits adhering to at least the end surface of a substrate by using a sponge-like brush. Ž<P>SOLUTION: The substrate cleaning apparatus 1 includes: a spin chuck 3 for rotatably holding a substrate W; a motor 4 for rotating the substrate W held in the spin chuck 3; a cleaning liquid supply mechanism 10 for supplying a cleaning liquid to the substrate W held in the spin chuck 3; a brush 21 abutting on at least the end surface of the substrate W during cleaning and made of a sponge-like resin; and brush compressing mechanisms 23a, 23b, 24 for compressing the brush 21. At least the end surface of the substrate W is cleaned while the brush 21 is compressed by the compressing mechanisms 23a, 23b, 24. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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