METHOD FOR MANUFACTURING PHASE SHIFT MASK AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

摘要

PROBLEM TO BE SOLVED: To obtain a high-quality phase shift mask with high reliability, suppressing generation of haze on the surface without degrading control of pattern dimensions and a phase difference with higher accuracy.

SOLUTION: When a phase shifter layer 2 is processed by using a light-shielding film 3 as a hard mask, a mixture gas of SF6and He is used as a first gas for an etching gas in a step S41, so as to subject the phase shifter layer 2 to dry etching; and in a step S42, a mixture gas of CF4and He is used as a second gas for an etching gas to subject a S layer 1a to dry etching to remove the layer.

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