发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS, WAFER POSITION CONTROL METHOD, AND WAFER POSITION CONTROL SYSTEM
摘要 PROBLEM TO BE SOLVED: To appropriately control an installation position of a wafer based on position detection of a semiconductor wafer carried in a treatment chamber. SOLUTION: This wafer position control system (50) includes: a plurality of sensors (15) arranged in a treatment unit for subjecting a semiconductor wafer to a temperature treatment, and detecting the height position of an edge of the semiconductor wafer; and a control computer (40) connected to the treatment unit and controlling the operation of the treatment unit based on the output of the treatment unit. The control computer includes: a determination part determining whether or not detection values of the plurality of sensors coincide with one another; and a control signal generation part generating a control signal in accordance with the determination result of the determination part. The control signal generation part generates a control signal notifying a first alarm when the detection values of the plurality of sensors do not coincide with one another in the determination result of the determination part and the difference among the detection values exceeds a threshold value. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010003844(A) 申请公布日期 2010.01.07
申请号 JP20080160937 申请日期 2008.06.19
申请人 FUJITSU MICROELECTRONICS LTD 发明人 HATANAKA KIMIE
分类号 H01L21/68;H01L21/027 主分类号 H01L21/68
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