METHOD OF MANUFACTURING SEMICONDUCTOR OPTICAL ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor optical element capable of preventing a semiconductor wafer from being damaged during a manufacturing process of the semiconductor optical element. SOLUTION: This method of manufacturing the semiconductor optical element includes: a first process of growing a semiconductor laminate 13 including an active layer 17 on a substrate 11; a second process of forming a silicon oxide film 21 having predetermined film stress and a predetermined thickness on the semiconductor laminate 13 after the first process; a third process of forming a stripe-like groove 25 on the silicon oxide film 21 by etching the silicon oxide film 21 until a surface of the semiconductor laminate 13 is exposed by using a resist 23 formed on the silicon oxide film 21 after the second process; and a fourth process of growing another part 19b of a p-type clad layer 19 in the groove 25 after the third process. COPYRIGHT: (C)2010,JPO&INPIT