CHARGED PARTICLE BEAM MACHINING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a charged particle beam machining apparatus that implements an improved apparatus availability factor by avoiding a machining error caused by a charging phenomenon of sputter emitted from a beam diaphragm. SOLUTION: The material of the beam diaphragm is predetermined such that a deposited film on an optical element surface downstream of the beam diaphragm which is generated by sputter particles emitted from the beam diaphragm is conductive. Preferably, the material of the beam diaphragm is carbon or a compound thereof. More preferably, an electrode having an electric potential is arranged downstream of the beam diaphragm. COPYRIGHT: (C)2010,JPO&INPIT