PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING IT, AND METHOD OF MANUFACTURING SEMICONDUCTOR ELEMENT

摘要

PROBLEM TO BE SOLVED: To form a resist pattern having excellent resolution and sensitivity.

SOLUTION: The photosensitive composition to which a high-energy beam having a wavelength in the band of 1-300 nm is irradiated includes a binder resin, and a photoelectron absorbing agent to be reacted with photoelectrons emitted from the binder resin absorbing the high-energy beam when the high-energy beam is irradiated onto the binder resin.

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