发明名称 |
SUBSTRATE PROCESSING METHOD, EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE |
摘要 |
Disclosed is a substrate processing method which includes an exposure step wherein an immersion area of a first liquid is formed on a substrate and the substrate is exposed by being irradiated with an exposure light through the first liquid, and an immersion step wherein the substrate is immersed in a second liquid before the exposure step. By this method, occurrences of problems caused by adhesion marks, which are always involved in immersion exposure, can be reduced. |
申请公布号 |
EP1814144(A4) |
申请公布日期 |
2010.01.06 |
申请号 |
EP20050805228 |
申请日期 |
2005.10.25 |
申请人 |
NIKON CORPORATION |
发明人 |
NAKANO, KATSUSHI;OKUMURA, MASAHIKO;SUGIHARA, TAROU;MIZUTANI, TAKEYUKI;FUJIWARA, TOMOHARU |
分类号 |
H01L21/027;G03F7/20;G03F7/38 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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