FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER READABLE STORAGE MEDIUM

摘要

PURPOSE: A film deposition apparatus, a film deposition method, and a computer readable storage medium are provided to prevent a reaction gas from being inserted into an isolation region. CONSTITUTION: A turn-table(2) comprises a substrate receiver along a turn rotational direction. A first reacting gas providing unit supplies the first reaction gas. A second reaction gas supply unit supplies the second reaction gas. An isolation area is located between the first process domain in which the first reaction gas is provided and the second process area in which the second reaction gas is provided. The center comprises an exhaust vent discharging along the side of the second isolation gas. A separation gas supply unit supplies the first separation gas within the isolation area. A ceiling surface(45) is formed at the space region and is faced with the one side of the turn-table.