发明名称 Radiation detecting apparatus and method for manufacturing the same
摘要 An underlayer of a phosphor layer is disposed on a sensor panel including two-dimensionally arranged photoelectric conversion devices. The surface of the underlayer is subjected to atmospheric pressure plasma treatment. The phosphor layer is formed on the surface-treated underlayer. Then, the phosphor layer is covered with a moisture-resistant protective layer, a reflection layer, and another protective layer. Thus, the phosphor layer is prevented from peeling due to adhesion failure, and is constituted of uniformly shaped crystals by vapor deposition. A resulting radiation detecting apparatus exhibits high sensitivity and high definition, producing a uniform photoelectric conversion efficiency.
申请公布号 US7642519(B2) 申请公布日期 2010.01.05
申请号 US20080260035 申请日期 2008.10.28
申请人 CANON KABUSHIKI KAISHA 发明人 NAGANO KAZUMI
分类号 G01T1/20;G01T1/24 主分类号 G01T1/20
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