| 摘要 |
In the plasma pretreatment a substrate, preferably a silicon solar cell, is transported into a pretreatment chamber (1). In this pretreatment chamber (1) is contained a gas mixture comprising at least NH3 or hydrogen. By means of a cathode (4) a plasma is generated in the pretreatment chamber (1) by means of a glow discharge. The atomic hydrogen in the plasma reacts hereby with the oxygen, which is located on the solar cell (25) in the form of an oxide layer. By modifying or removing the oxide layer, better passivation of the solar cell can be attained and, consequently, higher efficiency.
|
