| 摘要 |
PURPOSE: An apparatus for processing a waste gas is provided to secure a sufficient decomposing time of a waste gas by increasing a stay time of the waste gas inside a chamber. CONSTITUTION: An apparatus for processing a waste gas includes a chamber(100), a heater(110), an inflow part(120), and a vortex forming part(150). The chamber forms an appearance of a device. The heater is arranged inside the chamber in order to generate a heat. The inflow part is formed on the chamber. A waste gas is flowed inside the chamber through the inflow part. The vortex forming part is formed under the inflow part, is formed according to a circumference direction inside the chamber, and forms a vortex of the waste gas inside the chamber.
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