发明名称 |
METHOD OF DETERMINING DEFECTS IN A SUBSTRATE AND APPARATUS FOR EXPOSING A SUBSTRATE IN A LITHOGRAPHIC PROCESS |
摘要 |
<p>Method of determining defects in a substrate, the method comprising: scanning a scan range of the substrate with a sensor, the sensor projecting a beam of radiation on the substrate; measuring the fraction of the intensity of the radiation reflected from different substrate areas along the scan range; determining the variations of the measured fraction across the scan range; determining from the variations whether any defects are present in the substrate.</p> |
申请公布号 |
SG157313(A1) |
申请公布日期 |
2009.12.29 |
申请号 |
SG20090033317 |
申请日期 |
2009.05.14 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
SAHA, NILAY;PEN, HERMEN, FOLKEN |
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