| 摘要 |
PURPOSE: A substrate processing apparatus is provided to reduce an idle time of a nozzle by processing a plurality of substrates through a plurality of substrate supporting bars. CONSTITUTION: A process chamber(100) has a closed space. A plurality of substrate supporting parts(120a,120b) supports substrates(200a,200b) inside the process chamber. Each substrate supporting part includes a spin head, a shaft, a motor driving part, and a fixing chuck. The fixing chuck fixes the substrates. The shaft is formed to the center of the spin head. The motor driving part provides a rotating power of the spin head. A nozzle(130) is formed to an end of an arm in order to spray a chemical solution or a gas toward the substrate.
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