POLISHING APPARATUS OF SUBSTRATE END FACE AND POLISHING DETERMINING METHOD

摘要

PURPOSE: A substrate edge polishing device and a polishing determining method are provided, which judge polishing state accurately by setting upper and lower limits of load current. CONSTITUTION: A substrate edge polishing device comprises a polishing wheel(10), a rotation driving unit(20) of the polishing wheel, and a cutting edge transfer unit of the polishing wheel. The polishing wheel polishes cross section(1a) of a substrate. The rotation driving unit of the polishing wheel has a load current correcting unit and load current detection unit. The load current detection unit detects the load current by contact with the cross section of the substrate. The correcting unit corrects the load current which is generated since the side of the worn groove(14) of the polishing wheel comes into contact with the substrate.