| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a calibration method for calibrating a stage position of a lithography apparatus. <P>SOLUTION: This detection method detects a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate W or on a substrate table WT and preferably extends over a length at least 50 times wider than a width of the line. The extended pattern is focus sensitive. The detection method includes moving the substrate table WT in the first direction and measuring along the first direction the property of the extended pattern. The property may be a result of a physical property of the extended pattern in a second direction at a right angle to the first direction. A next step allows a calibration of a substrate table position to be derived from the measured position of the extended pattern. <P>COPYRIGHT: (C)2010,JPO&INPIT |
