| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an observation device for performing bright field observation and dark field observation by a simple constitution. Ž<P>SOLUTION: The observation device 1 includes a microscope 30 for observing the surface of a wafer 10 and an automatic focusing device 40 for matching the focus of the microscope 30 with the surface of the wafer 10 and further equipped with a scattered light detecting part 45 for detecting the abnormality of the surface of the wafer 10 by detecting the scattered light R12 produced on the surface of the wafer 10 illuminated with oblique light L1 using the oblique light illuminating part 41 of the automatic focusing device 40. When the surface of the wafer 10 is observed by the microscope 30 by matching the focus of the microscope 30 with the surface of the wafer 10 using the automatic focusing device 40, the abnormality of the surface of the wafer 10 is detected by the scattered light detecting part 45. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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