发明名称 |
METHOD FOR MANUFACTURING CONTACT STRUCTURE |
摘要 |
PURPOSE: A method for manufacturing a contact structure is provided to improve the reliability of a test process by using a second motherboard having a first motherboard and an opening having a conductive layer. CONSTITUTION: In a device, a first motherboard is prepared(S100). A bonding layer is formed on the first substrate through a sputtering process. A conductive layer is formed on the bonding layer through an evaporation process or the sputtering process. A second motherboard is prepared(S200), and the second substrate is formed on the second motherboard. An insulating layer is formed on the second substrate. A photoresist layer is formed on the insulating layer. The second motherboard is adhered on the first motherboard(S300). A contact structure is formed(S400), and the first motherboard and the second motherboard are removed(S500).
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申请公布号 |
KR20090130533(A) |
申请公布日期 |
2009.12.24 |
申请号 |
KR20080056218 |
申请日期 |
2008.06.16 |
申请人 |
WILL TECHNOLOGY CO., LTD. |
发明人 |
KIM, SANG IK;HAN, JEONG SEOB |
分类号 |
H01L21/66;G01R1/073 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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