发明名称 METHOD FOR MANUFACTURING CONTACT STRUCTURE
摘要 PURPOSE: A method for manufacturing a contact structure is provided to improve the reliability of a test process by using a second motherboard having a first motherboard and an opening having a conductive layer. CONSTITUTION: In a device, a first motherboard is prepared(S100). A bonding layer is formed on the first substrate through a sputtering process. A conductive layer is formed on the bonding layer through an evaporation process or the sputtering process. A second motherboard is prepared(S200), and the second substrate is formed on the second motherboard. An insulating layer is formed on the second substrate. A photoresist layer is formed on the insulating layer. The second motherboard is adhered on the first motherboard(S300). A contact structure is formed(S400), and the first motherboard and the second motherboard are removed(S500).
申请公布号 KR20090130533(A) 申请公布日期 2009.12.24
申请号 KR20080056218 申请日期 2008.06.16
申请人 WILL TECHNOLOGY CO., LTD. 发明人 KIM, SANG IK;HAN, JEONG SEOB
分类号 H01L21/66;G01R1/073 主分类号 H01L21/66
代理机构 代理人
主权项
地址