| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus and a vapor deposition method, in which the film thickness of a vapor deposition film can be detected with high detection accuracy and a vapor deposition film having a desired film thickness can be stably formed. Ž<P>SOLUTION: The vapor deposition apparatus 1 sublimes a vapor deposition material M and deposit the material at a predetermined vapor deposition position, and is equipped with: a housing container 4 having an opening 4a and housing the vapor deposition material M; a detecting mechanism detecting a deposition amount of the vapor deposition material M at a detection position different from the above vapor deposition position; and a control mechanism changing the detecting position in accordance with the shape of the vapor deposition material M in the housing container 4. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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