发明名称 METHOD AND SYSTEM FOR INSPECTING SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method and a system for inspecting a semiconductor device which enable pinpointing of a faulty spot in a short time. Ž<P>SOLUTION: A plurality of spots in an observation object area of the semiconductor device are irradiated locally by laser light as the light is made to scan the area, while the semiconductor device is made to operate for testing at the same time, and the result of this test is made to correspond to the position of irradiation of the laser light to produce a quality determination image made a two-dimensional image, so that the faulty spot may be pinpointed. In the case of producing the quality determination image with the maximum number of pixels allowed for one screen, in this method for inspecting the semiconductor device, the laser light irradiation is performed with the number of points of irradiation lessened and irradiation point intervals widened, while a range of the laser light scanning is left unvaried. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2009300202(A) 申请公布日期 2009.12.24
申请号 JP20080153853 申请日期 2008.06.12
申请人 TOSHIBA CORP 发明人 NORIMATSU KENJI
分类号 G01R31/302;G01R31/26;H01L21/66 主分类号 G01R31/302
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