发明名称 |
ATOMIC LAYER DEPOSITED TITANIUM-DOPED INDIUM OXIDE FILMS |
摘要 |
An apparatus and methods of forming the apparatus include a film of transparent conductive titanium-doped indium oxide for use in a variety of configurations and systems. The film of transparent conductive titanium-doped indium oxide may be structured as one or more monolayers. The film of transparent conductive titanium-doped indium oxide may be formed using atomic layer deposition.
|
申请公布号 |
US2009314345(A1) |
申请公布日期 |
2009.12.24 |
申请号 |
US20090551023 |
申请日期 |
2009.08.31 |
申请人 |
AHN KIE Y;FORBES LEONARD |
发明人 |
AHN KIE Y.;FORBES LEONARD |
分类号 |
H01L31/00;B32B17/06;G02B6/02;H01B5/14;H01J1/00;H01J1/62;H01L33/00 |
主分类号 |
H01L31/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|