| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure method and an exposure device capable of preventing deterioration in productivity while simultaneously reducing damage caused by vibration, and a device manufacturing method. <P>SOLUTION: The exposure method uses the exposure device to expose a substrate, wherein the exposure device includes a processing device for performing processing relating to the exposure processing, detects information relating to a relative positional relationship between the processing device and a reference point, and stands ready to perform the processing according to the result of the detection. <P>COPYRIGHT: (C)2010,JPO&INPIT |
