发明名称 SURFACE INSPECTION APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a surface inspection apparatus for rapidly and accurately adjusting an orientation of an optical axis of a semiconductor element. Ž<P>SOLUTION: In the surface inspection apparatus, a plurality of the semiconductor elements 13, 14 for irradiating laser lights are disposed within a casing 10 at an interval. Lenses 15, 15 for irradiating a to-be-irradiated object with linear lights are disposed in front of a plurality of the semiconductor elements 13, 14, and extend the lights from the semiconductor elements 13, 14 in the direction intersecting with the juxtaposition direction of the semiconductor elements. The lenses 15, 15 are disposed so as to straddle all disposed semiconductors 13, 14 in front of them. Adjustment means 19K, 19k for adjusting angles of the semiconductor elements 13, 14 are provided so as to independently adjust the orientations of the optical axes of a plurality of the semiconductor elements 13, 14 in the juxtaposition direction of the semiconductor elements. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2009300377(A) 申请公布日期 2009.12.24
申请号 JP20080158080 申请日期 2008.06.17
申请人 SOKI:KK 发明人 ONISHI KANEHIRO
分类号 G01N21/84;G01B11/24 主分类号 G01N21/84
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