| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve unevenness of a polishing rate by restraining generation of pad scraping in a polishing device for polishing a polishing target surface at an upward posture. <P>SOLUTION: A substrate holder 11 of the polishing device comprises: a holder base 110 in which a chuck for adsorbing and retaining a square substrate is arranged at the center section; a split retainer 120 formed by partitioning a disk-shaped retainer with a square hole at the center thereof in the front and rear direction; a retainer elevating mechanism 130 for moving up and down the split retainer with respect to the holder base; and a retainer opening and closing mechanism 150 formed openable and closable in a closed position where the split retainer is set in an integrated disk-shape by closing the split retainer, and in an opening position where a side end face of the square substrate is exposed by opening the split retainer. <P>COPYRIGHT: (C)2010,JPO&INPIT |
