发明名称 |
A NOVEL COATING HAVING REDUCED STRESS AND A METHOD OF DEPOSITING THE COATING ON A SUBSTRATE |
摘要 |
<p>A method of depositing a coating on a substrate, the method comprising the steps of: (a) depositing material on a substrate by performing a cathodic vacuum arc (CVA) deposition step; and (b) depositing material on a substrate by performing a physical vapor deposition (PVD) step that excludes CVA deposition wherein the thickness of the material deposited in step (a) is greater than the thickness of material deposited in step (b).</p> |
申请公布号 |
WO2009151404(A1) |
申请公布日期 |
2009.12.17 |
申请号 |
WO2009SG00207 |
申请日期 |
2009.06.09 |
申请人 |
NANOFILM TECHNOLOGIES INTERNATIONAL PTE LTD;SHI, XU |
发明人 |
SHI, XU |
分类号 |
C23C28/00 |
主分类号 |
C23C28/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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