发明名称 A NOVEL COATING HAVING REDUCED STRESS AND A METHOD OF DEPOSITING THE COATING ON A SUBSTRATE
摘要 <p>A method of depositing a coating on a substrate, the method comprising the steps of: (a) depositing material on a substrate by performing a cathodic vacuum arc (CVA) deposition step; and (b) depositing material on a substrate by performing a physical vapor deposition (PVD) step that excludes CVA deposition wherein the thickness of the material deposited in step (a) is greater than the thickness of material deposited in step (b).</p>
申请公布号 WO2009151404(A1) 申请公布日期 2009.12.17
申请号 WO2009SG00207 申请日期 2009.06.09
申请人 NANOFILM TECHNOLOGIES INTERNATIONAL PTE LTD;SHI, XU 发明人 SHI, XU
分类号 C23C28/00 主分类号 C23C28/00
代理机构 代理人
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