发明名称 Reverse side film laser circuit etching
摘要 A direct-write laser lithography system comprises a reel-to-reel feed system in a vacuum chamber that presents the clear film-side of a single-sided metal-clad tape to a laser for direct patterning of the metal. The laser beam is swept laterally across the tape by rotating mirrors, and is intense enough to ablate the metal but not so strong as to destroy the tape substrate. In one instance, two specialized lasers are used, one set to ablate large field areas, and the other tuned to scribe fine features and lines. The ablated metal blows off in a downward direction and is collected for recycling.
申请公布号 US7633035(B2) 申请公布日期 2009.12.15
申请号 US20060544499 申请日期 2006.10.05
申请人 MU-GAHAT HOLDINGS INC. 发明人 KIRMEIER JOSEF
分类号 B23K26/38 主分类号 B23K26/38
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