发明名称 PHOTODETECTOR, AND METHOD FOR MANUFACTURING SEMICONDUCTOR NANOPARTICLE EMBEDDED Si INSULATING FILM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a high performance photodetector comprising semiconductor nanoparticles embedded Si insulating film, and to provide a method for manufacturing the semiconductor nanoparticles embedded Si insulating film with stability and reliability, which is used for the photodetector. <P>SOLUTION: The photodetector 100 uses the semiconductor nanoparticles embedded insulating film, and is provided with: a bottom electrode 102; the semiconductor nanoparticles embedded Si insulating film 104 which overlaps the bottom electrode 102, and includes an element selected from a group consisting of N and C; and an upper electrode 106 which overlaps the semiconductor nanoparticles embedded Si insulating film 104. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2009290196(A) 申请公布日期 2009.12.10
申请号 JP20090059841 申请日期 2009.03.12
申请人 SHARP CORP 发明人 JOSHI POORAN CHANDRA;HAO CHAN;VOUTSAS APOSTOLOS T
分类号 H01L31/09;H01L21/314;H01L21/318 主分类号 H01L31/09
代理机构 代理人
主权项
地址