发明名称 METHOD FOR PRODUCING SPUTTERING TARGET FOR USE IN FORMING CHALCOPYRITE TYPE SEMICONDUCTOR FILM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for producing a sputtering target for use in forming a chalcopyrite type semiconductor film which is used when a light absorption layer of a solar cell is formed. <P>SOLUTION: This production method comprises: preparing a powder of a Cu-Se binary copper alloy, a powder of a Cu-In binary copper alloy, a powder of a Cu-Ga binary copper alloy, and a powder of a Cu-In-Ga ternary copper alloy as row material powders; preparing a mixture powder by blending and mixing the powder of the Cu-Se binary copper alloy with the powder of the Cu-In binary copper alloy, the powder of Cu-Ga binary copper alloy, or the powder of Cu-In-Ga ternary copper alloy so as to have a component composition expressed by Cu<SB>a</SB>In<SB>b</SB>Ga<SB>c</SB>Se<SB>d</SB>(wherein the unit is atom%; 25≤a≤65; 0≤b≤50; 0≤c≤30; 30≤d≤50; and a+b+c+d=100); preparing a hot-pressed body by hot-pressing the mixture powder; and cutting the surface of the hot-pressed body. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2009287092(A) 申请公布日期 2009.12.10
申请号 JP20080141802 申请日期 2008.05.30
申请人 MITSUBISHI MATERIALS CORP 发明人 MISEKI KENICHIRO;OTOMO KENJI
分类号 C22C9/00;B22F3/14;C22C1/02;C22C28/00;C22F1/00;C22F1/08;C23C14/34;H01L31/04 主分类号 C22C9/00
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